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Bibliographic Details
Publisher: Marcel Dekker Inc
Published date: 1998
Size: 6.5 x 9.5 inches
Weight: 2.7 pounds
Pages: 780
Publisher's Notes
This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.
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