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Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics. Symposium held April 5-8, 1999, San Francisco, California, USA by Huff, H.R., C.A. Richter, M.L. Green, G. Lucovsky, and T. Hattori (editors)

by Huff, H.R., C.A. Richter, M.L. Green, G. Lucovsky, and T. Hattori (editors)

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Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics.  Symposium held April 5-8, 1999, San Francisco, California, USA by Huff, H.R., C.A. Richter, M.L. Green, G. Lucovsky, and T. Hattori (editors)

Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics. Symposium held April 5-8, 1999, San Francisco, California, USA

by Huff, H.R., C.A. Richter, M.L. Green, G. Lucovsky, and T. Hattori (editors)

  • Used
  • Hardcover
Materials Research Society, 1999. Hardback w/o dust jacket, 615 pages, text is clean & unmarked, very good condition. ISBN: ISBN 1558994742.

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Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)
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Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)

by Huff, H.R. (ed)

  • Used
Condition
Used - Like New
ISBN 13
9781558994744
ISBN 10
1558994742
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1
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Chicago, Illinois, United States
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This seller has earned a 5 of 5 Stars rating from Biblio customers.
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Materials Research Society. Used - Like New. 1999. Small publisher's mark on bottom of text block. Otherwise, Fine.
Item Price
$18.00
$3.50 shipping to
Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)
Stock Photo: Cover May Be Different

Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)

by Huff, H.R. (ed)

  • Used
  • Hardcover
Condition
Used - Good
Binding
Hardcover
ISBN 13
9781558994744
ISBN 10
1558994742
Quantity Available
1
Seller
Chicago, Illinois, United States
Seller rating:
This seller has earned a 5 of 5 Stars rating from Biblio customers.
Item Price
$18.00
$3.50 shipping to

Show Details

Description:
Materials Research Society. Used - Good. 1999. Hardcover. Tears to bottom edge of pages from front endpapers through to p. ix. Remainder mark. Ends of spine bumped. Good.
Item Price
$18.00
$3.50 shipping to
Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)
Stock Photo: Cover May Be Different

Ultrathin SiO2 and Higg-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)

by Editor-M. L. Green; Editor-T. Hattori; Editor-H. R. Huff; Editor-G. Lucovsky; Editor-C. A. Richter

  • Used
  • good
  • Hardcover
Condition
Used - Good
Binding
Hardcover
ISBN 13
9781558994744
ISBN 10
1558994742
Quantity Available
1
Seller
HOUSTON, Texas, United States
Seller rating:
This seller has earned a 4 of 5 Stars rating from Biblio customers.
Item Price
$31.58
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Description:
Materials Research Society, 1999-09-01. Hardcover. Good.
Item Price
$31.58
FREE shipping to