Home High Dielectric Constant Materials: VLSI Mosfet Applications by Howard Huff (Editor); David Gilmer (Editor) (ISBN: 9783540210818)

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High Dielectric Constant Materials: VLSI Mosfet Applications Hardcover - 2004 - 2005th Edition

Name: High Dielectric Constant Materials : VLSI MOSFET Applications
Price: 274.92 GBP
Availability: InStock
Author: Howard Huff
ISBN: 9783540210818

by Howard Huff (Editor); David Gilmer (Editor)

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From the publisher

First line

High-k dielectrics are a technology landmark so fundamental as to raise important questions about the future economics of the industry.

From the rear cover

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO₂ gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.