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Principles of Chemical Vapor Deposition Hardcover - 2003
by D. M. Dobkin; M. K. Zuraw
First line
Inside most any semiconductor fabrication facility in the world at any given moment, there are operators and engineers standing in front of machines with shiny stainless steel facades, loading and unloading cassettes of wafers with complex patterns of dopants, defects, and films on their surfaces.
Details
- Title Principles of Chemical Vapor Deposition
- Author D. M. Dobkin; M. K. Zuraw
- Binding Hardcover
- Edition 1st
- Pages 273
- Volumes 1
- Language ENG
- Publisher Springer
- Date 2003-04-30
- Illustrated Yes
- Features Bibliography, Illustrated, Index
- ISBN 9781402012488 / 1402012489
- Weight 1.22 lbs (0.55 kg)
- Dimensions 9.41 x 6.48 x 0.91 in (23.90 x 16.46 x 2.31 cm)
- Library of Congress subjects Vapor-plating, Refractory coating
- Library of Congress Catalog Number 2003047499
- Dewey Decimal Code 539.709
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Principles of Chemical Vapor Deposition
by Daniel Dobkin
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- Hardcover
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- Hardcover
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- 9781402012488 / 1402012489
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Hard Cover. New. New Book; Fast Shipping from UK; Not signed; Not First Edition; The Principles of Chemical Vapor Deposition.
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Stock Photo: Cover May Be Different
Principles of Chemical Vapor Deposition
by Dobkin, D.M.; Zuraw, M.K
- New
- Hardcover
- Condition
- New
- Binding
- Hardcover
- ISBN 10 / ISBN 13
- 9781402012488 / 1402012489
- Quantity Available
- 1
- Seller
-
San Diego, California, United States
- Item Price
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$394.77$5.45 shipping to USA
Show Details
Description:
Springer, 2003-04-30. Hardcover. New. New. In shrink wrap. Looks like an interesting title!
Item Price
$394.77
$5.45
shipping to USA