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Doping Engineering for Front-End Processing: Volume 1070
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Doping Engineering for Front-End Processing: Volume 1070 Hardcover - 2008

by B. J. Pawlak (Editor); M. L. Pelaz (Editor); M. Law (Editor)


From the publisher

Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.

Details

  • Title Doping Engineering for Front-End Processing: Volume 1070
  • Author B. J. Pawlak (Editor); M. L. Pelaz (Editor); M. Law (Editor)
  • Binding Hardcover
  • Pages 319
  • Volumes 1
  • Language ENG
  • Publisher Cambridge University Press
  • Date 2008-10-17
  • ISBN 9781605110400 / 160511040X
  • Weight 1.25 lbs (0.57 kg)
  • Dimensions 9.2 x 6.3 x 0.9 in (23.37 x 16.00 x 2.29 cm)
  • Library of Congress subjects Semiconductors - Materials, Semiconductor doping
  • Library of Congress Catalog Number 2012360735
  • Dewey Decimal Code 621.381

Media reviews

Citations

  • Scitech Book News, 12/01/2008, Page 50
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Doping Engineering for Front-End Processing: Volume 1070 (MRS Proceedings)
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Doping Engineering for Front-End Processing: Volume 1070 (MRS Proceedings)

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Doping Engineering for Front-End Processing: Volume 1070 (MRS Proceedings)
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Doping Engineering for Front-End Processing: Volume 1070 (MRS Proceedings)

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Doping Engineering for Front-End Processing: Volume 1070 (MRS Proceedings)
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Doping Engineering for Front-End Processing: Volume 1070 (MRS Proceedings)

by Pawlak, B.J. (ed)

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Doping Engineering for Front-End Processing: Volume 1070 (MRS Proceedings)
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Doping Engineering for Front-End Processing: Volume 1070 (MRS Proceedings)

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Doping Engineering for Front-End Processing
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Doping Engineering for Front-End Processing

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Doping Engineering for Front-end Processing: Symposium Held March 25-27, 2008, San Francisco,...
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Doping Engineering for Front-end Processing: Symposium Held March 25-27, 2008, San Francisco, California, U.s.a: Vol 1070

by Pawlak, B. j. (Editor)/ Pelaz, M. l. (Editor)/ Law, M. (Editor)/ Suguro, K. (Editor)

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Doping Engineering for Front-End Processing: Volume 1070

Doping Engineering for Front-End Processing: Volume 1070

by B. J. Pawlak

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Hardback. New. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.
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