VLSI: TECHNOLOGY AND DESIGN

New York: IEEE Press - Institute of Electrical and Electronic Engineers, 1984. Illustrated Coated Boards. Very Good/No Jacket. 10 1/4 x 7 3/8. Let's see if we can sort this out. In 1983 the IEEE produced two special issues, "Micron ansd Submicron Circuit Engineering," and "VLSI Design: Problems and Tools." The contents of those issues, with the exception of two un-named papers that were considered "too specialized for the envisaged broader readership," have been republished in this publication. Addtionally the co-editors, both associated with IBM, contributed an original paper each, to bring the final number of papers back to where it began. The 25 papers - 23 reprinted, two new - have been grouped under the following topics: Overview; Lithography; Devices and Processes; Micron and Submicron Circuit Engineering - Digital and Analog Applications and Results; Modeling and Simulation of Devices and Circuits; Design Methodologies and Testing of VLSI Chips; International Aspects; and Outlook. 309 pages, with tables, figures, half-tones, Author Index, Subject Index, and Editor's Biographies; plus ix pages, Contents, Preface, and (editors') Foreword; References at the end of each paper. Covers insignificantly bumped at lower corners, otherwise clean and sound; text is clean and strong.